Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
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This document specifies a method for the quantitative depth profiling of amorphous
heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering
(MEIS).
BSI recommends this version of standard for organisations operating in or with the UK. The ISO edition is available here if required.