1 Scope
This document gives guidance and requirements on the optimization of sputter-depth
profiling parameters using appropriate single-layered and multilayered reference materials,
in order to achieve optimum depth resolution as a function of instrument settings
in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion
mass spectrometry.
This document is not intended to cover the use of special multilayered systems such
as delta doped layers.