PD ISO/TR 15969:2021

What is ISO/TR 15969 about?  

ISO/TR 15969 specifies guidelines for measuring the sputtered depth in sputtered depth profiling which are applicable to techniques of surface chemical analysis. The depth typically determined by this approach is between 1 nm to 500 μm. 

ISO/TR 15969 specifies determination of depth scale in sputtered depth profiling where signal intensity is obtained as a function of sputtering time. 

Who is ISO/TR 15969 for? 

ISO/TR 15969 on surface chemical analysis is relevant to: 

• Chemical engineers 
• Aerospace industry 
• Semiconductor industry 

Why should you use ISO/TR 15969?  

Depth profiling is a process where the element or chemical content of a sample is measured as a function of depth. Sputter depth profiling is a direct method to obtain the in-depth distribution of composition in thin films, at surfaces and at interfaces. 

Guidelines under ISO/TR 15969 help you in measuring the sputtered depth in sputtered depth profiling which helps in: 

• Determination of the depth scale in sputter depth profiling where signal intensity is obtained as a function of sputtering time 
• Enhancing the comparability of depth profiling data obtained with different instruments and to increase the reliability and use of depth profiling in industrial applications 

Overall, ISO/TR 15969 can serve as the basis for the development of International Standards on the measurement of sputtered depth. 

What’s changed since the last update? 

PD ISO/TR 15969:2021 supersedes DD ISO/TR 15969:2001 which is withdrawn. The main changes are: 

• Clarity in the applicable range of depth specified in scope 
• Clause 3 has been revised according to the latest edition of the ISO 18115 series