PD CEN ISO/TS 24971-2 Edition 1 gives you guidance on how to apply the BS EN ISO 14971 Medical devices — Application of risk management to medical devices to machine learning-enabled medical devices.
It explains the risks that machine learning can introduce, including issues linked to training data, bias, explainability, transparency, autonomy, cybersecurity, model drift and continuous learning.
PD CEN ISO/TS 24971-2 ED1 is designed to supplement existing medical device risk management standards, so you can address machine learning-specific issues across development, testing, deployment, retraining and post-production monitoring.
The standard is intended to be used alongside BS EN ISO 14971. It also builds on the general guidance in PD CEN ISO/TR 24971 by addressing risk management challenges unique to machine learning-enabled medical devices. It provides practical guidance on topics such as bias, training and test data, explainability, transparency, model drift, continuous learning, retraining and autonomy that are not covered in the same depth by existing risk management guidance.
This publication is relevant if you develop, assess, manage, or review machine learning-enabled medical devices.
It is particularly useful for:
PD CEN ISO/TS 24971-2 ED1 covers how to adapt risk management for machine learning-enabled medical devices throughout the lifecycle.
It includes guidance on:
This publication does not apply to machine learning-enabled medical devices that use large language models or generative AI.
If you work with machine learning-enabled medical devices, this publication helps you apply established risk management principles to technologies that behave differently from traditional devices.
Using it can help you:
It is among the latest international guidance documents focused specifically on applying ISO 14971 risk management principles to machine learning-enabled medical devices.
BSI recommends this version of standard for organisations operating in or with the UK. The ISO edition is available here if required.