Atomic layer deposition. Chemical characteristics and related process specifications of atomic layer deposition precursors
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1 Scope
This document defines the chemical characteristics and related process specifications
of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
Product Details
Descriptors
Atomic energy
Layered materials
Chemical elements and inorganic compound
Chemical tests
Specifications
Metal assay
Purity
ICS Codes
25.220.01 Surface treatment and coating in general